System of advanced technologies for preparation of carbon and silicon nanostructures (nanoCVD)

Uses chemical vapour deposition to prepare thin films of nanocrystalline diamond and/or silicon for use in nanoelectronics and bioelectronics applications.

Core facilities of Laboratory of diamond thin films and carbon nanostructures include of two unique microwave deposition systems. The microwave plasma CVD reactor with ellipsoidal cavity, i.e. focused plasma, is routinely used for growth of nanocrystalline diamond thin films (NCD) consisting of grains in size 20-200 nm. NCD films exhibit excellent optical and electronic properties which are good enough for fabrication of various demonstrators as FET transistors or sensors, for example phosgene gas sensors.

The pulsed microwave plasma CVD reactor in configuration with linear antenna (installed 2008) is presently used for growth nano- and poly-crystalline diamond film over large areas. We observed that process parameters as gas mixture (i.e. mainly adding CO2 to the gas mixture CH4+H2) and process pressure (i.e. the range 6-100 Pa) controls not only the crystal size but also porosity of grown films. Presently, the deposition system is used for fundamental studies of plasma process and growth of diamond films for multi-disciplinary oriented fields as tissue engineering and regenerative medicine.


Přístrojové vybavení: 

Microwave plasma CVD system with focused plasma (Aixtron)

Large area pulsed microwave plasma CVD system with linear antennas (Roth and Rau)

Reactive ion etching (Trion, Phantom LT)